LCD Manufacturing

To satisfy higher definition and market needs, Everlight Chemical is developing a wider range of materials for TFT-LCD Array color resist, touch panel resist and contrast color resist. In addition, we provide various kinds of transmittive and transflective type PDCR, overcoat photoresist, developer and thinner.

Product Name Applications Features
EPL 388 positive photoresists EPL 388 is a positive photoresist with excellent adhesion.
Which is suitable for spin process and LTPS array production.
• High sensitivity

• Excellent adhesion

• Excellent thermal resistance

• Wide process margin

Product Name Advantage Applications Features
EPL 356
Positive Photoresists
EPL 356 has excellent thermal resistance, high resolution, high sensitivity and can be coated on the metal circuit substrate without mura.
Which is applicable to PMOLED process.
Suitable for slit or spin process • High sensitive

• High resolution

• Excellent adhesion

• Excellent thermal resistance

ENPI 300
Alkali Developable Negative
Photoresist
High sensitive and excellent
heat resistance.
Applicable to PMOLED process
Suitable for spin process • High heat resistance

• High sensitive

Excellent adhesion

Good reverse taper shape

• Based on safety-solvent

Product Name Applications Features
IBR、IPR
Bezel-less Display UV Curing Ink
For bezel-less NB, MNT & TV LCD manufacture. • High UV LED curing speed

• Good adhesion

Product Name Type Applications Features Remarks
ENPD 22 & 23
Highly concentrated
inorganic aqueous alkaline developers
KOH type Use with negative type photoresist, and provide excellent
development.
Wide latitude for development process

Low foam bubbles formed during process

Highly concentrated solution with easy
handling

The alkali is concentrated, it must be diluted the straight developer with DI water before using, 1:50 for ENPD 22 and 1:100 for ENPD 23
ENPD 72 ENPD 80
Inorganic Aqueous Alkaline Developer
Buffer type Designed for negative type photoresist, and provides excellent development. Wide latitude for development process

Low foam bubbles formed during process

Highly concentrated solution with easy handling

The developer is concentrated, it must be diluted with DI water before using, 1:19 for ENPD 72 and 1:9 for ENPD 80)
Product Name Applications Features
EGC 18 Inorganic Alkaline Water Base Detergent For developer bench and pipe cleaning.
Exhibit better performance when combined with developer.
Excellent cleaning performance

Low foaming and fast de-foaming

High concentrated

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IC & Package Manufacturing | FPD Manufacturing  |  LED Manufacturing  | Application of Touch Panel