LCD Manufacturing
To satisfy higher definition and market needs, Everlight Chemical is developing a wider range of materials for TFT-LCD Array color resist, touch panel resist and contrast color resist. In addition, we provide various kinds of transmittive and transflective type PDCR, overcoat photoresist, developer and thinner.
| Product Name | Applications | Features |
|---|---|---|
| EPL 388 positive photoresists | EPL 388 is a positive photoresist with excellent adhesion. Which is suitable for spin process and LTPS array production. |
• High sensitivity
• Excellent adhesion • Excellent thermal resistance • Wide process margin |
| Product Name | Advantage | Applications | Features |
|---|---|---|---|
| EPL 356 Positive Photoresists |
EPL 356 has excellent thermal resistance, high resolution, high sensitivity and can be coated on the metal circuit substrate without mura. Which is applicable to PMOLED process. |
Suitable for slit or spin process | • High sensitive
• High resolution • Excellent adhesion • Excellent thermal resistance |
| ENPI 300 Alkali Developable Negative Photoresist |
High sensitive and excellent heat resistance. Applicable to PMOLED process |
Suitable for spin process | • High heat resistance
• High sensitive • Excellent adhesion • Good reverse taper shape • Based on safety-solvent |
| Product Name | Applications | Features |
|---|---|---|
| IBR、IPR Bezel-less Display UV Curing Ink |
For bezel-less NB, MNT & TV LCD manufacture. | • High UV LED curing speed
• Good adhesion |
| Product Name | Type | Applications | Features | Remarks |
|---|---|---|---|---|
| ENPD 22 & 23 Highly concentrated inorganic aqueous alkaline developers |
KOH type | Use with negative type photoresist, and provide excellent development. |
• Wide latitude for development process
• Low foam bubbles formed during process • Highly concentrated solution with easy |
The alkali is concentrated, it must be diluted the straight developer with DI water before using, 1:50 for ENPD 22 and 1:100 for ENPD 23 |
| ENPD 72 ENPD 80 Inorganic Aqueous Alkaline Developer |
Buffer type | Designed for negative type photoresist, and provides excellent development. | • Wide latitude for development process
• Low foam bubbles formed during process • Highly concentrated solution with easy handling |
The developer is concentrated, it must be diluted with DI water before using, 1:19 for ENPD 72 and 1:9 for ENPD 80) |
| Product Name | Applications | Features |
|---|---|---|
| EGC 18 Inorganic Alkaline Water Base Detergent | For developer bench and pipe cleaning. Exhibit better performance when combined with developer. |
• Excellent cleaning performance
• Low foaming and fast de-foaming • High concentrated |
– Other Product –