LED Manufacturing
We provides photoresists suitable for lift-off process and pss (Pattern Sapphire Substrate) process. We also provides a full array of related materials, including wafer polish slurries and developer. Due to our commitment to customer service, we developed technologies of ultra-clean manufacturing pp-level analysis and microlithography to ensure the quality of our products.
▍ESR 131
Excellent uniform and highly dispersed colloidal silica abrasives with special formulation
Alloy, stainless steel polishing.
- Damage free surface
- High removal rate
- Easy to post clean after polishing process
▍ESA 220
Good dispersed alumina abrasives with special formulation
For AlN substrate polishing. And can be used for metal materials stock removal polishing.
- Good suspension / re-dispersibility for work
- Designed for recirculating polishing
- Good surface quality
– Other Product –