LED Manufacturing
We provides photoresists suitable for lift-off process and pss (Pattern Sapphire Substrate) process. We also provides a full array of related materials, including wafer polish slurries and developer. Due to our commitment to customer service, we developed technologies of ultra-clean manufacturing pp-level analysis and microlithography to ensure the quality of our products.
▍ESR 500
Highly dispersed colloidal silica abrasives with special formulation
For sapphire substrate Polishing.
- High-removal-rate
- Wide process window and high stability
- Perfect surface quality
▍ESR 600
Highly dispersed colloidal silica abrasives with special formulation
For Sapphire (A-plane) polishing, application for cover lens of cell phone and watch.
- Designed for sapphire A-plane
- Removal rate is 50% higher than competitor
▍ESA 280
Highly dispersed colloidal silica abrasives with special formulation
For sapphire substrate polishing with high removal rate.
- Good suspension
- High Dilution application
- Re-dispersibility for work
- Good surface roughness ( Ra < 0.3 nm)
- Outstanding removal rate
– Other Product –