LED Manufacturing
We provides photoresists suitable for lift-off process and pss (Pattern Sapphire Substrate) process. We also provides a full array of related materials, including wafer polish slurries and developer. Due to our commitment to customer service, we developed technologies of ultra-clean manufacturing pp-level analysis and microlithography to ensure the quality of our products.
▍ESR 236
Highly dispersed colloidal silica abrasives with special formulation
With 20~40 times water dilution , delivers a high-removal-rate and damage-free surface for primary and secondary polishing silicon wafers, thereby can reduce the producing costs and raise the process yield.
- High-removal-rate
- Prolong pad lifetime
- Suitable for both non-circulating and circulating system
▍ESS 020
Highly dispersed colloidal silica abrasives with special formulation
Primary and secondary polish of silicon wafers and silicon materials.
- High-removal-rate
- Prolong pad lifetime
- Suitable for both non-circulating and circulating system
- High dilution application
▍ESS 100
Highly dispersed colloidal silica abrasives with special formulation
Stock polish of silicon wafers and silicon materials.
- High-removal-rate
- Prolong pad lifetime
- Suitable for both non-circulating and circulating system
- High dilution application
– Other Product –