{"id":941,"date":"2024-04-24T09:52:04","date_gmt":"2024-04-24T01:52:04","guid":{"rendered":"https:\/\/ecbu.ecic.com\/?page_id=941"},"modified":"2024-04-24T11:03:03","modified_gmt":"2024-04-24T03:03:03","slug":"touch-taiwan-2024-focus","status":"publish","type":"page","link":"https:\/\/ecbu.ecic.com\/touch-taiwan-2024-focus\/","title":{"rendered":"2024 TOUCH TAIWAN \u4eae\u9ede\u7522\u54c1"},"content":{"rendered":"

2024 TOUCH TAIWAN \u4eae\u9ede\u7522\u54c1<\/p><\/h1><\/div><\/div><\/div><\/div><\/div>

\"2024<\/span><\/div>
<\/div>
<\/div><\/div>
<\/div>
<\/div><\/div><\/div><\/div><\/div>

Photoresist for Extra Low Temp. Process<\/span><\/h3>\n<\/div>
  • <\/i><\/span>
    \n

    EK 670<\/p>\n<\/div><\/li>

  • <\/i><\/span>
    \n

    EOC 360<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

    • <\/i><\/span>
      \n

      Features:<\/h4>\n<\/div><\/li><\/ul>
        \n
      1. Negative type photoresist for extra low temperature process. (post bake temp. 85\u2103)<\/li>\n
      2. For flexible substrate. (COP\u3001PET\u3001PI ,etc.)<\/li>\n
      3. For I-line and broad band exposure equipment.<\/li>\n
      4. High resolution photoresists. (I-line)<\/li>\n<\/ol>\n<\/div><\/div><\/div>
        <\/div><\/div><\/div><\/div><\/div><\/div>

        OC Photoresist for Low Temp. Process<\/span><\/h3>\n<\/div>
        • <\/i><\/span>
          \n

          EOC 355<\/p>\n<\/div><\/li>

        • <\/i><\/span>
          \n

          EOC 375<\/p>\n<\/div><\/li>

        • <\/i><\/span>
          \n

          EOC 385<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

          • <\/i><\/span>
            \n

            Features:<\/h4>\n<\/div><\/li><\/ul>
              \n
            1. Good adhesion after chemical resistance test.<\/li>\n
            2. Good adhesion after moisture resistance test.<\/li>\n
            3. Suitable for KOH type developer.<\/li>\n<\/ol>\n<\/div><\/div><\/div>
              <\/div><\/div><\/div><\/div><\/div><\/div>

              OC Photoresist for LED Sensor Application<\/span><\/h3>\n<\/div>
              • <\/i><\/span>
                \n

                EverPN 310<\/p>\n<\/div><\/li>

              • <\/i><\/span>
                \n

                EverPN 320<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

                • <\/i><\/span>
                  \n

                  Features:<\/h4>\n<\/div><\/li><\/ul>
                    \n
                  1. Good adhesion on Si wafer.<\/li>\n
                  2. Good adhesion after moisture resistance test.<\/li>\n
                  3. Good surface resistance.<\/li>\n
                  4. Good transmittance.<\/li>\n
                  5. Suitable for TMAH type developer.<\/li>\n<\/ol>\n<\/div><\/div><\/div>
                    <\/div><\/div><\/div><\/div><\/div><\/div>

                    FOPLP Photoresist<\/span><\/h3>\n<\/div>
                    • <\/i><\/span>
                      \n

                      ECA 100 Series<\/p>\n<\/div><\/li>

                    • <\/i><\/span>
                      \n

                      EPP 200 Series<\/p>\n<\/div><\/li>

                    • <\/i><\/span>
                      \n

                      EverPI\u00ae P90 Series<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

                      • <\/i><\/span>
                        \n

                        Features of Photoresist for Plating:<\/h4>\n<\/div><\/li><\/ul>
                          \n
                        1. High Sensitivity<\/li>\n
                        2. High Aspect Ratio<\/li>\n<\/ol>\n<\/div>
                          • <\/i><\/span>
                            \n

                            Features of Photoresist for Dielectric:<\/h4>\n<\/div><\/li><\/ul>
                              \n
                            1. Low curing temperature (180\u2103).<\/li>\n
                            2. High resolution.<\/li>\n
                            3. Development with 2.38% TMAH.<\/li>\n
                            4. Good chemical resistance.<\/li>\n
                            5. Excellent adhesion to substrates.<\/li>\n<\/ol>\n<\/div><\/div><\/div>
                              <\/div><\/div><\/div><\/div><\/div><\/div>

                              ICP Process Photoresist<\/span><\/h3>\n<\/div>
                              • <\/i><\/span>
                                \n

                                EPG 560 Series<\/p>\n<\/div><\/li>

                              • <\/i><\/span>
                                \n

                                EPG 5650 Series<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

                                • <\/i><\/span>
                                  \n

                                  Features:<\/h4>\n<\/div><\/li><\/ul>
                                    \n
                                  1. Good dry etching resistance.<\/li>\n
                                  2. Apply to scribe line or mesa process.<\/li>\n
                                  3. High resolution.<\/li>\n<\/ol>\n<\/div><\/div><\/div>
                                    <\/div><\/div><\/div><\/div><\/div><\/div>

                                    Lift-off Process Photoresist<\/span><\/h3>\n<\/div>
                                    • <\/i><\/span>
                                      \n

                                      ENPI 200 Series<\/p>\n<\/div><\/li>

                                    • <\/i><\/span>
                                      \n

                                      ENPI 300 Series<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

                                      • <\/i><\/span>
                                        \n

                                        Features:<\/h4>\n<\/div><\/li><\/ul>
                                          \n
                                        1. Wide PEB latitude.<\/li>\n
                                        2. Can be stripped.<\/li>\n
                                        3. Overhang can be changed by adjusted process condition.<\/li>\n<\/ol>\n<\/div><\/div><\/div>
                                          <\/div><\/div><\/div><\/div><\/div><\/div>

                                          Photosensitive Polyimide (PSPI) <\/span><\/h3>\n<\/div>
                                          • <\/i><\/span>
                                            \n

                                            EverPI\u00ae P09 Series<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

                                            • <\/i><\/span>
                                              \n

                                              Features:<\/h4>\n<\/div><\/li><\/ul>
                                                \n
                                              1. Development with 2.38% TMAH.<\/li>\n
                                              2. Good chemical resistance.<\/li>\n
                                              3. High resolution.<\/li>\n<\/ol>\n<\/div><\/div><\/div>
                                                <\/div><\/div><\/div><\/div><\/div><\/div>

                                                Negative-Tone Photosensitive Polyimide<\/span><\/h3>\n<\/div>
                                                • <\/i><\/span>
                                                  \n

                                                  EverPI\u00ae NSA08<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

                                                  • <\/i><\/span>
                                                    \n

                                                    Features:<\/h4>\n<\/div><\/li><\/ul>
                                                      \n
                                                    1. Low curing temperature (180\u2103).<\/li>\n
                                                    2. Good chemical resistance.<\/li>\n
                                                    3. Excellent adhesion to substrates.<\/li>\n<\/ol>\n<\/div><\/div><\/div>
                                                      <\/div><\/div><\/div><\/div><\/div><\/div>

                                                      Photoresist Stripper<\/span><\/h3>\n<\/div>
                                                      • <\/i><\/span>
                                                        \n

                                                        EverSP 200 Series<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

                                                        • <\/i><\/span>
                                                          \n

                                                          Features:<\/h4>\n<\/div><\/li><\/ul>
                                                            \n
                                                          1. NMP & DMSO free<\/li>\n
                                                          2. Water soluble formulation<\/li>\n
                                                          3. Low metal corrosion<\/li>\n<\/ol>\n<\/div><\/div><\/div>
                                                            <\/div><\/div><\/div><\/div><\/div><\/div>

                                                            Black side Sealant for curved monitor<\/span><\/h3>\n<\/div>
                                                            • <\/i><\/span>
                                                              \n

                                                              IBR Seies<\/p>\n<\/div><\/li>

                                                            • <\/i><\/span>
                                                              \n

                                                              IPR Series<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

                                                              • <\/i><\/span>
                                                                \n

                                                                Features:<\/h4>\n<\/div><\/li><\/ul>
                                                                  \n
                                                                1. Enviroment Friendly Green Adhesives: Solvent free system.<\/li>\n
                                                                2. Energy Saving : UV curing process.<\/li>\n
                                                                3. Reduce carbon emissions : Automated production line.<\/li>\n
                                                                4. Realize high immersion.<\/li>\n<\/ol>\n<\/div><\/div><\/div>
                                                                  <\/div><\/div><\/div><\/div><\/div><\/div>

                                                                  High Barrier UV-curing Sealants<\/span><\/h3>\n<\/div>
                                                                  • <\/i><\/span>
                                                                    \n

                                                                    IPR 8000 Series<\/p>\n<\/div><\/li><\/ul><\/div><\/div><\/div><\/div><\/div>

                                                                    • <\/i><\/span>
                                                                      \n

                                                                      Features:<\/h4>\n<\/div><\/li><\/ul>
                                                                        \n
                                                                      1. Solvent-free \/ Anti-yellowing \/ Chemical inertness.<\/li>\n
                                                                      2. Protection for moisture-sensitive electronic devices.<\/li>\n
                                                                      3. Adhesion for flexible\/rigid\/composite substrates.<\/li>\n
                                                                      4. High transparency in the visible light range.<\/li>\n<\/ol>\n<\/div><\/div><\/div>
                                                                        <\/div><\/div><\/div><\/div><\/div><\/div><\/p>\n","protected":false},"excerpt":{"rendered":"","protected":false},"author":2,"featured_media":943,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"yoast_head":"\n2024 TOUCH TAIWAN \u4eae\u9ede\u7522\u54c1 - \u6c38\u5149\u5316\u5b78\u2500\u96fb\u5316\u4e8b\u696d<\/title>\n<meta name=\"description\" content=\"2024 TOUCH TAIWAN x \u6c38\u5149\u5316\u5b78\uff0c\u5c55\u51fa\u4e4b\u4eae\u9ede\u7522\u54c1\u3002\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/ecbu.ecic.com\/touch-taiwan-2024-focus\/\" \/>\n<meta property=\"og:locale\" content=\"zh_TW\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"2024 TOUCH TAIWAN \u4eae\u9ede\u7522\u54c1 - \u6c38\u5149\u5316\u5b78\u2500\u96fb\u5316\u4e8b\u696d\" \/>\n<meta property=\"og:description\" content=\"2024 TOUCH TAIWAN x \u6c38\u5149\u5316\u5b78\uff0c\u5c55\u51fa\u4e4b\u4eae\u9ede\u7522\u54c1\u3002\" \/>\n<meta property=\"og:url\" content=\"https:\/\/ecbu.ecic.com\/touch-taiwan-2024-focus\/\" \/>\n<meta property=\"og:site_name\" content=\"\u6c38\u5149\u5316\u5b78\u2500\u96fb\u5316\u4e8b\u696d\" \/>\n<meta property=\"article:modified_time\" content=\"2024-04-24T03:03:03+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/ecbu.ecic.com\/wp-content\/uploads\/2024\/04\/240321_AD_970x250px.gif\" \/>\n\t<meta property=\"og:image:width\" content=\"970\" \/>\n\t<meta property=\"og:image:height\" content=\"250\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/gif\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"\u9810\u4f30\u95b1\u8b80\u6642\u9593\" \/>\n\t<meta name=\"twitter:data1\" content=\"3 \u5206\u9418\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/ecbu.ecic.com\/touch-taiwan-2024-focus\/\",\"url\":\"https:\/\/ecbu.ecic.com\/touch-taiwan-2024-focus\/\",\"name\":\"2024 TOUCH TAIWAN \u4eae\u9ede\u7522\u54c1 - 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