2024 TOUCH TAIWAN 亮點產品
Photoresist for Extra Low Temp. Process
- Negative type photoresist for extra low temperature process. (post bake temp. 85℃)
- For flexible substrate. (COP、PET、PI ,etc.)
- For I-line and broad band exposure equipment.
- High resolution photoresists. (I-line)
OC Photoresist for Low Temp. Process
- Good adhesion after chemical resistance test.
- Good adhesion after moisture resistance test.
- Suitable for KOH type developer.
OC Photoresist for LED Sensor Application
- Good adhesion on Si wafer.
- Good adhesion after moisture resistance test.
- Good surface resistance.
- Good transmittance.
- Suitable for TMAH type developer.
FOPLP Photoresist
- High Sensitivity
- High Aspect Ratio
- Low curing temperature (180℃).
- High resolution.
- Development with 2.38% TMAH.
- Good chemical resistance.
- Excellent adhesion to substrates.
ICP Process Photoresist
- Good dry etching resistance.
- Apply to scribe line or mesa process.
- High resolution.
Lift-off Process Photoresist
- Wide PEB latitude.
- Can be stripped.
- Overhang can be changed by adjusted process condition.
Photosensitive Polyimide (PSPI)
- Development with 2.38% TMAH.
- Good chemical resistance.
- High resolution.
Negative-Tone Photosensitive Polyimide
- Low curing temperature (180℃).
- Good chemical resistance.
- Excellent adhesion to substrates.
Photoresist Stripper
- NMP & DMSO free
- Water soluble formulation
- Low metal corrosion
Black side Sealant for curved monitor
- Enviroment Friendly Green Adhesives: Solvent free system.
- Energy Saving : UV curing process.
- Reduce carbon emissions : Automated production line.
- Realize high immersion.
High Barrier UV-curing Sealants
- Solvent-free / Anti-yellowing / Chemical inertness.
- Protection for moisture-sensitive electronic devices.
- Adhesion for flexible/rigid/composite substrates.
- High transparency in the visible light range.